The Fractilia Overlay Package Measures SEM overlay between features and calculates the overlay distributions, across-wafer variations, and much more
Stochastics metrology and control solutions provider Fractilia has unveiled its new optional overlay package. The Fractilia Overlay Package adds critical new overlay measurement and analysis capabilities, which is compatible with Fractilia’s MetroLER and FAME products.
Key information:
- Fractilia has launched its new Fractilia Overlay Package, which provides new overlay measurements and analysis capabilities.
- The stochastic metrology control solution provider's latest product is compatible with the company's MetroLER and FAME products.
- Said products give proven fab solutions that provide accurate measurements of all major stochastic effects.
Following the announcement, the company has been working with multiple chip manufacturers, who are using Fractilia’s new product to analyse their SEM-based overlay data. The new technology adds accurate SEM-based overlay measurements, including its stochastic properties.
Overlays, in the context of semiconductor manufacturing, is the precise placement of each patterned layer relative to a previous layer, which helps produce a functioning electrical device. To ensure high-yielding and high-performing devices, chip manufacturers use optical-based metrology tools to measure and control pattern overlay. With the reduction of chip sizes, there has been a growth in interest in SEM tools, as they are high-resolution and precision optical tools.
"SEM-based overlay measurements are increasingly being used to improve advanced patterning process control, but they are influenced by the same random and systematic SEM errors that affect other stochastics measurements," stated Chris Mack, Fractilia CTO. "Fractilia is unparalleled in measuring and subtracting out SEM noise through our proven FILM technology, and as a result, our customers are turning to Fractilia to help them apply our technology to improve the accuracy of their SEM overlay measurements. In addition, by combining SEM stochastics measurements with optical overlay measurements through our Fractilia Overlay Package, we believe that we not only can improve SEM overlay metrology accuracy, but also provide better lot dispositioning and correctables, which in turn can improve patterning control and reduce non-zero offset (NZO) or its variability."