Gauss Labs upgrades its AI-based virtual metrology solution

“Our concerted efforts over the past 4 years are now creating a meaningful impact in the semiconductor industry, the most advanced manufacturing sector.”

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Gauss Labs has released the second version of its AI-based virtual metrology solution, Panoptes VM 2.0. Providing all wafer measurement data in real-time, Panoptes VM works by predicting process outcomes by analysing sensor data. Users will be able to predict the process results of all products without obtaining physical full-scale measurements. As a result, this solution will be able to save time and limit wasted resources.

According to the developers, the latest version of the system will include new modelling features like multi-step modelling, operation-group modelling, and automatic model selection. These capabilities can help improve the accuracy and usability levels of predicted data.

Introducing Panoptes VM 2.0’s new modelling features:

  • Multi-step modelling claims to cover the etching process effectively, as well as the creation of prediction models using data from both current and previous steps.
  • Operation-group modelling will allow the user to group data from similar operations to create more effective models.
  • Automatic model selection supports multi-algorithm architecture and automatically selects the best-performing model to improve accuracy and usability levels.

“Our concerted efforts over the past 4 years are now creating a meaningful impact in the semiconductor industry, the most advanced manufacturing sector. Equipped with our state-of-the-art industrial AI technology, we will continue our march towards the global industrial AI market,” said Mike Kim, Chief Executive Officer of Gauss Labs.